The 2012 Plasma Roadmap
Identifieur interne : 005525 ( Main/Exploration ); précédent : 005524; suivant : 005526The 2012 Plasma Roadmap
Auteurs : Seiji Samukawa [Japon] ; Masaru Hori [Japon] ; Shahid Rauf [États-Unis] ; Kunihide Tachibana [Japon] ; Peter Bruggeman [Pays-Bas] ; Gerrit Kroesen [Pays-Bas] ; J Christopher Whitehead [Royaume-Uni] ; Anthony B. Murphy [Australie] ; Alexander F. Gutsol [États-Unis] ; Svetlana Starikovskaia [France] ; Uwe Kortshagen [États-Unis] ; Jean-Pierre Boeuf [France] ; Timothy J. Sommerer [États-Unis] ; Mark J. Kushner [États-Unis] ; Uwe Czarnetzki [Allemagne] ; Nigel Mason [Royaume-Uni]Source :
- Journal of Physics D: Applied Physics [ 0022-3727 ] ; 2012-06-27.
Descripteurs français
- Wicri :
- topic : Base de données, Physique du plasma, Simulation.
English descriptors
- KwdEn :
- Appl, Atmospheric pressure, Catal, Catalysis, Catalyst, Cell membrane, Chemical reactions, Combustible, Combustible mixtures, Computational, Database, Deposition, Diagnostics, Dielectric, Downconversion, Eld, Electric propulsion, Electromagnetic, Electromagnetic effects, Etching, Excitation, Fundamental understanding, Future challenges, Future nanoscale devices, Gure, Hets, Ieee, Ieee trans, Ionization, Kinetics, Larger dimensions, Laser, Ltps, Magnetic nozzle, Microplasma, Microplasmas, Microwave sources, Modelling, Molecular data, Molecular species, Nanodusty, Nanodusty plasmas, Nanoparticle, Nanoparticles, Nanoscale, Nanosecond, Nucleation, Other hand, Photon, Photon irradiation, Photoresist polymers, Phys, Plasma, Plasma catalysis, Plasma community, Plasma diagnostics, Plasma etching, Plasma medicine, Plasma modelling, Plasma parameters, Plasma physics, Plasma process, Plasma processes, Plasma processing, Plasma science, Plasma sources, Plasma spraying, Plasma thrusters, Plasma treatment, Proc, Reactive, Reactive species, Review article, Review article figure, Roadmap, Samukawa, Secondary electron emission, Semiconductor, Simulation, Spectroscopic, Such data, Surface interactions, Surface processes, Technol, Thermal plasmas, Thruster, Time scales, Trans, Uxes, Vapour, Wide range.
- Teeft :
- Appl, Atmospheric pressure, Catal, Catalysis, Catalyst, Cell membrane, Chemical reactions, Combustible, Combustible mixtures, Computational, Database, Deposition, Diagnostics, Dielectric, Downconversion, Eld, Electric propulsion, Electromagnetic, Electromagnetic effects, Etching, Excitation, Fundamental understanding, Future challenges, Future nanoscale devices, Gure, Hets, Ieee, Ieee trans, Ionization, Kinetics, Larger dimensions, Laser, Ltps, Magnetic nozzle, Microplasma, Microplasmas, Microwave sources, Modelling, Molecular data, Molecular species, Nanodusty, Nanodusty plasmas, Nanoparticle, Nanoparticles, Nanoscale, Nanosecond, Nucleation, Other hand, Photon, Photon irradiation, Photoresist polymers, Phys, Plasma, Plasma catalysis, Plasma community, Plasma diagnostics, Plasma etching, Plasma medicine, Plasma modelling, Plasma parameters, Plasma physics, Plasma process, Plasma processes, Plasma processing, Plasma science, Plasma sources, Plasma spraying, Plasma thrusters, Plasma treatment, Proc, Reactive, Reactive species, Review article, Review article figure, Roadmap, Samukawa, Secondary electron emission, Semiconductor, Simulation, Spectroscopic, Such data, Surface interactions, Surface processes, Technol, Thermal plasmas, Thruster, Time scales, Trans, Uxes, Vapour, Wide range.
Abstract
Low-temperature plasma physics and technology are diverse and interdisciplinary fields. The plasma parameters can span many orders of magnitude and applications are found in quite different areas of daily life and industrial production. As a consequence, the trends in research, science and technology are difficult to follow and it is not easy to identify the major challenges of the field and their many sub-fields. Even for experts the road to the future is sometimes lost in the mist. Journal of Physics D: Applied Physics is addressing this need for clarity and thus providing guidance to the field by this special Review article, The 2012 Plasma Roadmap. Although roadmaps are common in the microelectronic industry and other fields of research and development, constructing a roadmap for the field of low-temperature plasmas is perhaps a unique undertaking. Realizing the difficulty of this task for any individual, the plasma section of the Journal of Physics D Board decided to meet the challenge of developing a roadmap through an unusual and novel concept. The roadmap was divided into 16 formalized short subsections each addressing a particular key topic. For each topic a renowned expert in the sub-field was invited to express his/her individual visions on the status, current and future challenges, and to identify advances in science and technology required to meet these challenges. Together these contributions form a detailed snapshot of the current state of the art which clearly shows the lifelines of the field and the challenges ahead. Novel technologies, fresh ideas and concepts, and new applications discussed by our authors demonstrate that the road to the future is wide and far reaching. We hope that this special plasma science and technology roadmap will provide guidance for colleagues, funding agencies and government institutions. If successful in doing so, the roadmap will be periodically updated to continue to help in guiding the field.
Url:
DOI: 10.1088/0022-3727/45/25/253001
Affiliations:
- Allemagne, Australie, France, Japon, Pays-Bas, Royaume-Uni, États-Unis
- Angleterre, Californie, Grand Manchester, Michigan, Minnesota, Région de Tōhoku, Région du Kansai
- Kyoto, Manchester, Sendai
- Université de Kyoto, Université de Manchester, Université du Tōhoku
Links toward previous steps (curation, corpus...)
- to stream Istex, to step Corpus: 002985
- to stream Istex, to step Curation: 002985
- to stream Istex, to step Checkpoint: 000450
- to stream Main, to step Merge: 005792
- to stream Main, to step Curation: 005525
Le document en format XML
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Gutsol</name><affiliation wicri:level="2"><country xml:lang="fr">États-Unis</country><wicri:regionArea>Chevron Energy Technology Company, 100 Chevron Way, Richmond, CA 94802</wicri:regionArea><placeName><region type="state">Californie</region></placeName></affiliation><affiliation></affiliation></author><author><name sortKey="Starikovskaia, Svetlana" sort="Starikovskaia, Svetlana" uniqKey="Starikovskaia S" first="Svetlana" last="Starikovskaia">Svetlana Starikovskaia</name><affiliation wicri:level="1"><country xml:lang="fr">France</country><wicri:regionArea>Laboratoire de Physique des Plasmas, Ecole Polytechnique, Route de Saclay, 91128 Palaiseau Cedex</wicri:regionArea><wicri:noRegion>91128 Palaiseau Cedex</wicri:noRegion><wicri:noRegion>91128 Palaiseau Cedex</wicri:noRegion></affiliation><affiliation wicri:level="1"><country wicri:rule="url">France</country></affiliation></author><author><name sortKey="Kortshagen, Uwe" sort="Kortshagen, Uwe" uniqKey="Kortshagen U" first="Uwe" last="Kortshagen">Uwe Kortshagen</name><affiliation wicri:level="2"><country xml:lang="fr">États-Unis</country><wicri:regionArea>Mechanical Engineering Department, University of Minnesota, 111 Church St. SE, Minneapolis, MN 55455</wicri:regionArea><placeName><region type="state">Minnesota</region></placeName></affiliation><affiliation wicri:level="1"><country wicri:rule="url">États-Unis</country></affiliation></author><author><name sortKey="Boeuf, Jean Pierre" sort="Boeuf, Jean Pierre" uniqKey="Boeuf J" first="Jean-Pierre" last="Boeuf">Jean-Pierre Boeuf</name><affiliation wicri:level="1"><country xml:lang="fr">France</country><wicri:regionArea>Laboratoire Plasma et Conversion d'Energie (LAPLACE), Universit de Toulouse, Bt. 3R2, 118 Route de Narbonne, F-31062 Toulouse Cedex 9</wicri:regionArea><wicri:noRegion>31062 Toulouse Cedex 9</wicri:noRegion><wicri:noRegion>F-31062 Toulouse Cedex 9</wicri:noRegion></affiliation><affiliation wicri:level="1"><country wicri:rule="url">France</country></affiliation></author><author><name sortKey="Sommerer, Timothy J" sort="Sommerer, Timothy J" uniqKey="Sommerer T" first="Timothy J" last="Sommerer">Timothy J. Sommerer</name><affiliation wicri:level="1"><country xml:lang="fr">États-Unis</country><wicri:regionArea>General Electric Research, One Research Circle, Niskayuna, New York 12309</wicri:regionArea><wicri:noRegion>New York 12309</wicri:noRegion></affiliation><affiliation></affiliation></author><author><name sortKey="Kushner, Mark J" sort="Kushner, Mark J" uniqKey="Kushner M" first="Mark J" last="Kushner">Mark J. Kushner</name><affiliation wicri:level="2"><country xml:lang="fr">États-Unis</country><wicri:regionArea>Electrical Engineering and Computer Science Department, University of Michigan, 1301 Beal Ave, Ann Arbor, MI 48109-2122</wicri:regionArea><placeName><region type="state">Michigan</region></placeName></affiliation><affiliation wicri:level="1"><country wicri:rule="url">États-Unis</country></affiliation></author><author><name sortKey="Czarnetzki, Uwe" sort="Czarnetzki, Uwe" uniqKey="Czarnetzki U" first="Uwe" last="Czarnetzki">Uwe Czarnetzki</name><affiliation wicri:level="1"><country xml:lang="fr">Allemagne</country><wicri:regionArea>Institute for Plasma and Atomic Physics, Ruhr-University Bochum, 44780 Bochum</wicri:regionArea><wicri:noRegion>44780 Bochum</wicri:noRegion><wicri:noRegion>44780 Bochum</wicri:noRegion></affiliation><affiliation wicri:level="1"><country wicri:rule="url">Allemagne</country></affiliation></author><author><name sortKey="Mason, Nigel" sort="Mason, Nigel" uniqKey="Mason N" first="Nigel" last="Mason">Nigel Mason</name><affiliation wicri:level="1"><country xml:lang="fr">Royaume-Uni</country><wicri:regionArea>Department of Physics and Astronomy, The Open University, Walton Hall, Milton Keynes MK7 6AA</wicri:regionArea><wicri:noRegion>Milton Keynes MK7 6AA</wicri:noRegion></affiliation><affiliation wicri:level="1"><country wicri:rule="url">Royaume-Uni</country></affiliation></author></analytic><monogr></monogr><series><title level="j">Journal of Physics D: Applied Physics</title><idno type="ISSN">0022-3727</idno><idno type="eISSN">1361-6463</idno><imprint><publisher>IOP Publishing</publisher><date type="published" when="2012-06-27">2012-06-27</date><biblScope unit="volume">45</biblScope><biblScope unit="issue">25</biblScope></imprint><idno type="ISSN">0022-3727</idno></series></biblStruct></sourceDesc><seriesStmt><idno type="ISSN">0022-3727</idno></seriesStmt></fileDesc><profileDesc><textClass><keywords scheme="KwdEn" xml:lang="en"><term>Appl</term><term>Atmospheric pressure</term><term>Catal</term><term>Catalysis</term><term>Catalyst</term><term>Cell membrane</term><term>Chemical reactions</term><term>Combustible</term><term>Combustible mixtures</term><term>Computational</term><term>Database</term><term>Deposition</term><term>Diagnostics</term><term>Dielectric</term><term>Downconversion</term><term>Eld</term><term>Electric propulsion</term><term>Electromagnetic</term><term>Electromagnetic effects</term><term>Etching</term><term>Excitation</term><term>Fundamental understanding</term><term>Future challenges</term><term>Future nanoscale devices</term><term>Gure</term><term>Hets</term><term>Ieee</term><term>Ieee trans</term><term>Ionization</term><term>Kinetics</term><term>Larger dimensions</term><term>Laser</term><term>Ltps</term><term>Magnetic nozzle</term><term>Microplasma</term><term>Microplasmas</term><term>Microwave sources</term><term>Modelling</term><term>Molecular data</term><term>Molecular species</term><term>Nanodusty</term><term>Nanodusty plasmas</term><term>Nanoparticle</term><term>Nanoparticles</term><term>Nanoscale</term><term>Nanosecond</term><term>Nucleation</term><term>Other hand</term><term>Photon</term><term>Photon irradiation</term><term>Photoresist polymers</term><term>Phys</term><term>Plasma</term><term>Plasma catalysis</term><term>Plasma community</term><term>Plasma diagnostics</term><term>Plasma etching</term><term>Plasma medicine</term><term>Plasma modelling</term><term>Plasma parameters</term><term>Plasma physics</term><term>Plasma process</term><term>Plasma processes</term><term>Plasma processing</term><term>Plasma science</term><term>Plasma sources</term><term>Plasma spraying</term><term>Plasma thrusters</term><term>Plasma treatment</term><term>Proc</term><term>Reactive</term><term>Reactive species</term><term>Review article</term><term>Review article figure</term><term>Roadmap</term><term>Samukawa</term><term>Secondary electron emission</term><term>Semiconductor</term><term>Simulation</term><term>Spectroscopic</term><term>Such data</term><term>Surface interactions</term><term>Surface processes</term><term>Technol</term><term>Thermal plasmas</term><term>Thruster</term><term>Time scales</term><term>Trans</term><term>Uxes</term><term>Vapour</term><term>Wide range</term></keywords><keywords scheme="Teeft" xml:lang="en"><term>Appl</term><term>Atmospheric pressure</term><term>Catal</term><term>Catalysis</term><term>Catalyst</term><term>Cell membrane</term><term>Chemical reactions</term><term>Combustible</term><term>Combustible mixtures</term><term>Computational</term><term>Database</term><term>Deposition</term><term>Diagnostics</term><term>Dielectric</term><term>Downconversion</term><term>Eld</term><term>Electric propulsion</term><term>Electromagnetic</term><term>Electromagnetic effects</term><term>Etching</term><term>Excitation</term><term>Fundamental understanding</term><term>Future challenges</term><term>Future nanoscale devices</term><term>Gure</term><term>Hets</term><term>Ieee</term><term>Ieee trans</term><term>Ionization</term><term>Kinetics</term><term>Larger dimensions</term><term>Laser</term><term>Ltps</term><term>Magnetic nozzle</term><term>Microplasma</term><term>Microplasmas</term><term>Microwave sources</term><term>Modelling</term><term>Molecular data</term><term>Molecular species</term><term>Nanodusty</term><term>Nanodusty plasmas</term><term>Nanoparticle</term><term>Nanoparticles</term><term>Nanoscale</term><term>Nanosecond</term><term>Nucleation</term><term>Other hand</term><term>Photon</term><term>Photon irradiation</term><term>Photoresist polymers</term><term>Phys</term><term>Plasma</term><term>Plasma catalysis</term><term>Plasma community</term><term>Plasma diagnostics</term><term>Plasma etching</term><term>Plasma medicine</term><term>Plasma modelling</term><term>Plasma parameters</term><term>Plasma physics</term><term>Plasma process</term><term>Plasma processes</term><term>Plasma processing</term><term>Plasma science</term><term>Plasma sources</term><term>Plasma spraying</term><term>Plasma thrusters</term><term>Plasma treatment</term><term>Proc</term><term>Reactive</term><term>Reactive species</term><term>Review article</term><term>Review article figure</term><term>Roadmap</term><term>Samukawa</term><term>Secondary electron emission</term><term>Semiconductor</term><term>Simulation</term><term>Spectroscopic</term><term>Such data</term><term>Surface interactions</term><term>Surface processes</term><term>Technol</term><term>Thermal plasmas</term><term>Thruster</term><term>Time scales</term><term>Trans</term><term>Uxes</term><term>Vapour</term><term>Wide range</term></keywords><keywords scheme="Wicri" type="topic" xml:lang="fr"><term>Base de données</term><term>Physique du plasma</term><term>Simulation</term></keywords></textClass><langUsage><language ident="en">en</language></langUsage></profileDesc></teiHeader><front><div type="abstract">Low-temperature plasma physics and technology are diverse and interdisciplinary fields. The plasma parameters can span many orders of magnitude and applications are found in quite different areas of daily life and industrial production. As a consequence, the trends in research, science and technology are difficult to follow and it is not easy to identify the major challenges of the field and their many sub-fields. Even for experts the road to the future is sometimes lost in the mist. Journal of Physics D: Applied Physics is addressing this need for clarity and thus providing guidance to the field by this special Review article, The 2012 Plasma Roadmap. Although roadmaps are common in the microelectronic industry and other fields of research and development, constructing a roadmap for the field of low-temperature plasmas is perhaps a unique undertaking. Realizing the difficulty of this task for any individual, the plasma section of the Journal of Physics D Board decided to meet the challenge of developing a roadmap through an unusual and novel concept. The roadmap was divided into 16 formalized short subsections each addressing a particular key topic. For each topic a renowned expert in the sub-field was invited to express his/her individual visions on the status, current and future challenges, and to identify advances in science and technology required to meet these challenges. Together these contributions form a detailed snapshot of the current state of the art which clearly shows the lifelines of the field and the challenges ahead. Novel technologies, fresh ideas and concepts, and new applications discussed by our authors demonstrate that the road to the future is wide and far reaching. We hope that this special plasma science and technology roadmap will provide guidance for colleagues, funding agencies and government institutions. If successful in doing so, the roadmap will be periodically updated to continue to help in guiding the field.</div></front></TEI><affiliations><list><country><li>Allemagne</li><li>Australie</li><li>France</li><li>Japon</li><li>Pays-Bas</li><li>Royaume-Uni</li><li>États-Unis</li></country><region><li>Angleterre</li><li>Californie</li><li>Grand Manchester</li><li>Michigan</li><li>Minnesota</li><li>Région de Tōhoku</li><li>Région du Kansai</li></region><settlement><li>Kyoto</li><li>Manchester</li><li>Sendai</li></settlement><orgName><li>Université de Kyoto</li><li>Université de Manchester</li><li>Université du Tōhoku</li></orgName></list><tree><country name="Japon"><region name="Région de Tōhoku"><name sortKey="Samukawa, Seiji" sort="Samukawa, Seiji" uniqKey="Samukawa S" first="Seiji" last="Samukawa">Seiji Samukawa</name></region><name sortKey="Hori, Masaru" sort="Hori, Masaru" uniqKey="Hori M" first="Masaru" last="Hori">Masaru Hori</name><name sortKey="Hori, Masaru" sort="Hori, Masaru" uniqKey="Hori M" first="Masaru" last="Hori">Masaru Hori</name><name sortKey="Samukawa, Seiji" sort="Samukawa, Seiji" uniqKey="Samukawa S" first="Seiji" last="Samukawa">Seiji Samukawa</name><name sortKey="Tachibana, Kunihide" sort="Tachibana, Kunihide" uniqKey="Tachibana K" first="Kunihide" last="Tachibana">Kunihide Tachibana</name><name sortKey="Tachibana, Kunihide" sort="Tachibana, Kunihide" uniqKey="Tachibana K" first="Kunihide" last="Tachibana">Kunihide Tachibana</name></country><country name="États-Unis"><region name="Californie"><name sortKey="Rauf, Shahid" sort="Rauf, Shahid" uniqKey="Rauf S" first="Shahid" last="Rauf">Shahid Rauf</name></region><name sortKey="Gutsol, Alexander F" sort="Gutsol, Alexander F" uniqKey="Gutsol A" first="Alexander F" last="Gutsol">Alexander F. Gutsol</name><name sortKey="Kortshagen, Uwe" sort="Kortshagen, Uwe" uniqKey="Kortshagen U" first="Uwe" last="Kortshagen">Uwe Kortshagen</name><name sortKey="Kortshagen, Uwe" sort="Kortshagen, Uwe" uniqKey="Kortshagen U" first="Uwe" last="Kortshagen">Uwe Kortshagen</name><name sortKey="Kushner, Mark J" sort="Kushner, Mark J" uniqKey="Kushner M" first="Mark J" last="Kushner">Mark J. Kushner</name><name sortKey="Kushner, Mark J" sort="Kushner, Mark J" uniqKey="Kushner M" first="Mark J" last="Kushner">Mark J. Kushner</name><name sortKey="Sommerer, Timothy J" sort="Sommerer, Timothy J" uniqKey="Sommerer T" first="Timothy J" last="Sommerer">Timothy J. Sommerer</name></country><country name="Pays-Bas"><noRegion><name sortKey="Bruggeman, Peter" sort="Bruggeman, Peter" uniqKey="Bruggeman P" first="Peter" last="Bruggeman">Peter Bruggeman</name></noRegion><name sortKey="Bruggeman, Peter" sort="Bruggeman, Peter" uniqKey="Bruggeman P" first="Peter" last="Bruggeman">Peter Bruggeman</name><name sortKey="Kroesen, Gerrit" sort="Kroesen, Gerrit" uniqKey="Kroesen G" first="Gerrit" last="Kroesen">Gerrit Kroesen</name><name sortKey="Kroesen, Gerrit" sort="Kroesen, Gerrit" uniqKey="Kroesen G" first="Gerrit" last="Kroesen">Gerrit Kroesen</name></country><country name="Royaume-Uni"><region name="Angleterre"><name sortKey="Whitehead, J Christopher" sort="Whitehead, J Christopher" uniqKey="Whitehead J" first="J Christopher" last="Whitehead">J Christopher Whitehead</name></region><name sortKey="Mason, Nigel" sort="Mason, Nigel" uniqKey="Mason N" first="Nigel" last="Mason">Nigel Mason</name><name sortKey="Mason, Nigel" sort="Mason, Nigel" uniqKey="Mason N" first="Nigel" last="Mason">Nigel Mason</name><name sortKey="Whitehead, J Christopher" sort="Whitehead, J Christopher" uniqKey="Whitehead J" first="J Christopher" last="Whitehead">J Christopher Whitehead</name></country><country name="Australie"><noRegion><name sortKey="Murphy, Anthony B" sort="Murphy, Anthony B" uniqKey="Murphy A" first="Anthony B" last="Murphy">Anthony B. Murphy</name></noRegion><name sortKey="Murphy, Anthony B" sort="Murphy, Anthony B" uniqKey="Murphy A" first="Anthony B" last="Murphy">Anthony B. Murphy</name></country><country name="France"><noRegion><name sortKey="Starikovskaia, Svetlana" sort="Starikovskaia, Svetlana" uniqKey="Starikovskaia S" first="Svetlana" last="Starikovskaia">Svetlana Starikovskaia</name></noRegion><name sortKey="Boeuf, Jean Pierre" sort="Boeuf, Jean Pierre" uniqKey="Boeuf J" first="Jean-Pierre" last="Boeuf">Jean-Pierre Boeuf</name><name sortKey="Boeuf, Jean Pierre" sort="Boeuf, Jean Pierre" uniqKey="Boeuf J" first="Jean-Pierre" last="Boeuf">Jean-Pierre Boeuf</name><name sortKey="Starikovskaia, Svetlana" sort="Starikovskaia, Svetlana" uniqKey="Starikovskaia S" first="Svetlana" last="Starikovskaia">Svetlana Starikovskaia</name></country><country name="Allemagne"><noRegion><name sortKey="Czarnetzki, Uwe" sort="Czarnetzki, Uwe" uniqKey="Czarnetzki U" first="Uwe" last="Czarnetzki">Uwe Czarnetzki</name></noRegion><name sortKey="Czarnetzki, Uwe" sort="Czarnetzki, Uwe" uniqKey="Czarnetzki U" first="Uwe" last="Czarnetzki">Uwe Czarnetzki</name></country></tree></affiliations></record>Pour manipuler ce document sous Unix (Dilib)
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